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MEMSnet Home: MEMS-Talk: Refractive Index of Photoresists
Refractive Index of Photoresists
2007-02-09
Martyn Gadsdon
2007-02-09
Robert Black
2007-02-12
mohendra roy
2007-02-09
Bill Moffat
2007-02-09
Roger Shile
2007-02-13
Bill Moffat
2007-02-11
Shay Kaplan
Refractive Index of Photoresists
Roger Shile
2007-02-09
Bill,

What advantage does using ammonia vapor to achieve image reversal have over
using an image reversal resist, such as AZ5214-E, which doesn't require any
additional equipment?

Roger Shile

-----Original Message-----
On Behalf Of Bill Moffat

Subject: RE: [mems-talk] Refractive Index of Photoresists

Martyn,
       An interesting question.  As image reversal depends upon the
refractive index on resist you would think we would have the answer.  I
am ashamed to say we do not.  If you are looking for differences in
resist profile caused by refraction index changes I may be able to help
you. Using ammonia to reverse the action of your original exposure and a
controlled flood exposure and develop.  The resist side wall can be
controlled between -22 degrees through vertical to + 22 degrees.  If
this is of any help contact me directly for technical papers and
information on free testing.

Bill Moffat, CEO
Yield Engineering Systems, Inc.


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