Dear Jochen
Have you tried Cerisulfat as an etchant solution ( Ce(SO4)2 ) ?
It etches around 300Å/min and gives a smooth surface. It also etches any
thin layer of Cr-oxide on the surface.

Sincerely, Mounir
------------------------------------------
Mounir Ennabli, Transducer group
Mikroelektronik Center
Technical University of Denmark
Room 154, building 345E, 2800 Lyngby
Phone(o): +45 4525 5734
Phone(h): +45 4587 3535-1283
Fax:     +45 4588 7762
e-mail: [email protected]
http://www.dtu.dk/mic/


        -----Original Message-----
        From:   Jochen Hetzler
[SMTP:[email protected]]
        Sent:   7. maj 1998 12:57
        To:     [email protected]
        Subject:        surface strukture of Cr

        Hello
        -----

        I want to etch 150nm thick Chromium films (vapor deposition with
2 nm/sec).
        After deposition the films are smooth on a scale of 20 nm.
During etching with
        NaOH : K3Fe(CN)6 : H20 = 1:2:8 the roughness increases
dramatically on a
        scale of about 200 nm. How could I reduce this effect?

        Yours sincerely
           Jochen