Hi guys
I just start working with PDMS and I want to obtain a 100 um film of PDMS
paterned. I am depositing this PDMs on a paterned Si wafer covered with
rezist, Then I want to peel it and stick it on a SI/Au film covered also
with reszist ( maybe SU8)

So my question are
1. Does anybody knows more about this method of evaporation of PDMS
dissolved in cyclohexane works? Concentrations, temperature
conditions,baking methods, steps any useful tips, etc? Eventually a link to
some basic of this mehod

2 FOr sticking I am using now a Plasma O2 etching. But now I am working with
PDMS kind of thick ( 1 -2 mm) obtained by mixing, taking the air off, baking
1 hour at 65 C and then plasma etching. This method will work for 100
micrometers?

Thanks in advance

Petru