Hi,

I would like to use  electron beam evaporation in order to evaporate silica
on a gold substrate for isolation purposes. I have tried this but I did not
get adhesion between SiO2 and gold. Does anyone have any suggestions to what
adhesion layer and how much of it I should use in order to acheive an SiO2
layer of 100 nm on sputtered gold. I do not have a CVD system so i need to
use thermal evaporation.

Regards,
Leyla Soleymani
University of Toronto
[email protected]