Hi all,

Try a double spincoat process with AZ4562 or AZ9260.
Resist layers up to 70µm were achieved.

Regards,
Peter Kuijpers
MiPlaza
DTS/TFF
High Tech Campus 04
Room: WAGp5-11
5656 AE Eindhoven
The Netherlands

Phone.:  (+31 40 27) 98904 (mobex)
mobile:(+31) 06-12507027
fax.:     [+31 40 27) 44769
mailto:[email protected]

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06-03-2007 20:37

Subject
[mems-talk] Methods to make thick resist layer
Classification

Hi all,
   I am wondering if there is an easy way to make features higher than
50 um with a 10 um gap. I've tried su8 which can give thick resist in
one spin, but the gap didn't come out (using transparency mask). With
SPR or AZ resist, the gap can be made successfully, but it seems hard
to go higher than 50 um. I am wondering if anyone had similar
experience and any suggestion is gratefully acknoledged.