I've never used AZ photoresist, but I'd suggest you try slowing down
your deposition rate. If you deposit too fast, it's possible that you
could heat the resist too much and change it somehow (making it less
soluble).

hope that helps.
Joe

Yue Mun Pun, Jeffrey wrote:
> Hi,
> Can anyone help me on this?
>
> In addition to what I did below, using ultrasonic treatment, I had also tried
to heat the substrate in AZ300 stripper at 80-90'C and again treated the
substrate with sonication.  Hoowever, some of the gold-coated resist still
remain on the glass wafer.