Hello Ciro,
i never worked with your resist, i usually use Shipley S1813 and BHF wet
etch solution (HF:NH4F, 1:7). S1823 peel off after different hours.
Let me know if you need details on how to process S1813.

Best regards,
Andrea



> Hi
>
> I have to etch a 2000Ã… thick silicon rich nitride film under a
> photoresist
> (AZ5209) mask. I need to get a nitride mask since the next step is
> electrochemical etching in EToH:HF 3:7. I am currently RIE etching it, but
> the process is very time consuming.
>
> I tried wet etch both HF:H2O 1:10 AND HF:HCL 1:1 but the resist gets
> peeled
> off in few minutes.
>
> Do you have any alternative recipe to suggest?
>
> Thanks
>
> Ciro Chiappini
> UT-Austin/UT-Health Science Center Houston
> Biomedical Engineering Department
> Dr. Mauro Ferrari Nanomedicine Lab
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