Hi John! Hope BU is treating you well.  I would use the thermal deposition and
raise the background pressure a bit. Try introducing some argon.  Your surface
roughness will increase with pressure.

-Mike
 U. of Louisville

>>>  4/19/2007 10:55 AM >>>
We'd like to deposit ~50nm Al layers with controlled surface
roughnesses ranging from ~5nm Rms to above 10nm Rms. I'm using a Sharon
e-beam evaporator system for the deposition but also have access to an
Edwards Thermal evaporator. The greater Rms roughness the better. Any
ideas?
Thanks,
John Henson
Boston University