Hello All,

I am interested in etching quartz using photoresist as the mask. From a
reference I found that BHF etches quartz at high speed and does not affect
Shipley series photoresist. But when I did perform the etch I found that the
photoresist has all been removed by the BHF solution. Can you please let me
know what is going wrong. I am presently not using PDMS adhesive layer
before coating photoresist on quartz. Could this be a reason?

Please let me know.

Thanks a lot,
Sreemanth