I think you mean HMDS? Yes it will help. Also ensure you dehydrate your
quartz thoroughly before coating (~220C for 30mins or so).
A Cr/Au layer is also commonly used as an additional etch barrier.

Sreemanth M Uppuluri wrote:
> Hello All,
>
> I am interested in etching quartz using photoresist as the mask. From
> a reference I found that BHF etches quartz at high speed and does not
> affect Shipley series photoresist. But when I did perform the etch I
> found that the photoresist has all been removed by the BHF solution.
> Can you please let me know what is going wrong. I am presently not
> using PDMS adhesive layer before coating photoresist on quartz. Could
> this be a reason?