A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: silicon nitride etch by koh?!
Au-etchant attacking plated nickel
2007-05-21
Sven Holmström
2007-05-21
David Nemeth
silicon nitride etch by koh?!
2007-05-21
Andrea Mazzolari
2007-05-22
Jordi Teva
2007-05-22
Shay Kaplan
2007-05-22
IGOR KADIJA
2007-05-22
Kirt Williams
silicon nitride etch by koh?!
Shay Kaplan
2007-05-22
Andrea,
If you used nitride other than LPCVD nitride - it will be etched by hot KOH.
Also, even LPCVD nitride etches slowly in hot KOH. One reason for higher
etch rates in KOH is fluoride leftovers in the solution from HF or BOE
cleans prior to KOH

shay

-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Andrea Mazzolari
Sent: Monday, May 21, 2007 11:01 PM
To: General MEMS discussion
Subject: [mems-talk] silicon nitride etch by koh?!

Hi all,
i deposited about 20nm of silicon nitride on a silicon wafer.
After patterning silicon nitride, i etched silicon in KOH (20%) at 100°C.
After about 2 hours etch, silicon nitride was completely removed!
I always knew silicon nitride perfecly mask against KOH etch!
What could be happened ?
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Tanner EDA by Mentor Graphics
Addison Engineering
Harrick Plasma, Inc.
Mentor Graphics Corporation