Hi All,
I am going to do PECVD SiO2 on some silicon samples for the future
hydrophobic surface modification with SAM (like OTS) materials. I am
looking for some pre-PECVD clean procedure for this process. Any
sugesstions? The silicon sample with native oxide layer, and I will
first Pirnha clean it. I am not sure whether the 5:1:1 H2O:H2O2:HCl
clean and the Buffered HF clean should be followed in this process.
Thanks.
Oh, BTW, does anyboday have any info about the effect of thickness of
PECVD SiO2 on finial hydrophobicity with SAM modification.

Thank you very much!

Regards,
Steven