Hi Jeffrey;
You can try 1:2,5 AZ400 Developer. And you can expose 600 mJ for direct
litography. You will obtain 1 or 1,5 minutes developer time.

Tolga YELBOGA
Project Engineer
Nanotechnology Researh Center
Bilkent University
Bilkent, Ankara 06800 TURKEY
Voice: 90-312-290-1020
www.nanotr.bilkent.edu.tr

-----Original Message-----
From: [email protected] [mailto:[email protected]]
On Behalf Of Yue Mun Pun, Jeffrey
Sent: Friday, May 25, 2007 8:15 AM
To: [email protected]
Subject: [mems-talk] Developer for AZ9260

Hi,
I am trying to pattern gold metal lines (100microns width) via lift-off
using AZ9260 resist.  The gold thickness is about 600nm.  After spiining the
AZ9260 at about 2400rpm for 60s, I discovered that the resist is about
7-8micorns thick, which is sufficiently thick for the lift-off process.
May I know which developer is recommended?  I use AZ400K Developer :DI water
in the ration of 1:4 for 8-9 mins and found that this works but the timing
is very critical because a shorter time results in resist remaining and a
longer time than this causes my patterns to be lifted off in the development
process.