Hi Everybody,

I am looking for a suitable mask for ICP (dry etching) process. I normally
use map1275 (7.5 um thick) photoresist from Microresist.
Problem with this photoresist is that I have adhesion problems on silicon di
oxide. I do use HMDS adhesion layer, but that doesn't help.
I spoke to microresist engineer and she told me problem is probably humidity
is my cleanroom is too high. Unfortunately I cannot change that. Hence I am
looking for other thick photoresist, which is less sensitive to humidity or
any other material.

Could anybody help?

Arti Tibrewala