Dear all,

I am looking for helpful info regarding etching glass or quartz
substrate with higher etch rate and vertical sidewall. Traditional HF
etching gives isotropical etch and STS dry etch with F radical gives
slow etch rate, they are all not good for my case since I am etching
around 30-50um deep wells inside the substrate.

Anyone can share your experience? Or anyone can provide the information
of the vendor who can do this job.

Appreciate your help .

Michael