New to the MEMS field and currently doing MEMS mask design for a
microfluidic system. I got 3 type system patterns, each has the area
around 0.5 x 1.5 cm, 1.5 x 1.5 cm, and  1x1.5cm. But i need to vary
the flow channel size and sub-patterns in each type system pattern for
the investigation. Therefore, how to use as few as possible mask to
achieve this?

I was thinking that only one mask can get it done (as my patterns are
all flow field and flow channel with same depth). However, I heard
there is a die size limitation in lithography of IC, which means one
mask can only cover wafer with area around few square meters. In my
case, seems I need a lot of masks if I need to achieve all pattern on
one wafer with different sub-pattern from each other . Is this true?
or there is any other different design rule for MEMS, cos MEMS size
normally very big comparing to IC and sometime even single system will
beyond few squaer cm.

THank you all in advance for any experience sharing.

Steven.