What about the thermal mismatch between mask and substrate. This sounds
like an impossibility.

                                                -CHM

On Fri, 24 Jul 1998, miyazaki wrote:

> Dear Dr. mems@ISI.EDU
>
> Thank you everyone.
>
> I'm eagerly looking for the high overlay accuracy aligner.
>
> My R&D is on diffactive optics elements ( DOEs ) making.
> I hope to make multi-level ( multi-step ) DOEs with aligner lithography and
etching on SiC or other material which can be reactively etched.
>
> The first , I wish to look the high overlay accuracy aligner or make it with
aligner maker.
>  The specification is <0.01 micron.
>
> Do you know something on high overlay accuracy aligner machine ?
> Please send me some e-mail.
>
>
>
>
> Best regards,
>
>                                   NALUX    http://www.nalux.co.jp
>                                      R&D
>                                        Atsushi Miyazaki
>                                          E-mail : atushi_m@yo.rim.or.jp
>
>