Hi all, i need to make etch of germanium.
As etchant i plan to use HNA solution. Here are the steps:

1) deposition of 100nm Cr mask
2) deposition of photoresist s1813 and patterning
3) etch Cr  (???)
4) Germanium etch (HNA).

could someone give me suggestions about a proper etchant which will etch
Cr layer without attack s1813 ?

Best regards,
Andrea