May I ask why do you have to use PR as a mask?

On 10/1/07, Nitin Shukla  wrote:
> Hi,
>   I would appreciate if anyone could suggest me a photoresist that would not
be etched by TMAH or KOH.
>


--
Xiaoguang "Leo" Liu
Birck Nanotechnology Center,
Purdue University,
1205 W.State Street, West Lafayette, IN, 47906 USA
[email protected]