In the past when I've etched quartz, I've always gotten polymer build-up
with I didn't add at least a little oxygen.

On 10/2/07, Edward Sebesta  wrote:
>
> Aluminum is fairly impervious to CF4. AlF3 isn't volatile at all. So you
> could us it or Al2O3. You should avoid heat and do the deposition cold
> so the Al won't react with your quartz.
>
> I would look down the periodic table for other metals with involitle
> fluorides.
>
> I am not sure why you don't use resist for this. If you are in a SiO2
> etch mode, with no O2 added, and maybe a little H2 or CHF3, the resist
> should be fairly resistant, though I am not sure it would be good for 10
> microns.