just a thought, but what if you span photoresist on a glass wafer, and
performed lithography on it? you wouldn't even need a fancy mask aligner.
for your feature sizes, you could just use a transparency from a laser
printer and a UV lamp. then, after the photoresist was patterned, you could
HF it.

On 10/2/07, jpt sharma  wrote:
>
> Hi All
>   I am trying to make clear physical mask of feature size ~1 mm. Is there
> anyway to make it other than machining? The thickness is about ~0.8 mm.