Hello all,
       I'd like to get  a thin oxadation layer (100-500A) on the surface of my
structure, but  thermal oxidation is forbidden for its high temperature (lower
than 300 ¡ãC is OK).  Now, I want to dip the whole wafer into hydrogen
peroxide (H2O2)  or put it into oven (120 ¡ãC) for a while.   Are
these method available?   If not, is there any other methods to achieve such a
thin oxadation layer (100-500A).  Does anyone has experience to to this? Thanks
a lot.

Best wishes!
X.Yan
[email protected]