Hi,

I tried RF magnetron sputtering of AlN target.

If you need to pattern the AlN film, you will need to play around with KOH wet
etching. But KOH etches photoresist, so do take note of this.

Best regards,
TK

________________________________

From: Gary Hillman [mailto:[email protected]]
Sent: Fri 11/2/2007 10:47 PM
To: 'General MEMS discussion'
Subject: RE: [mems-talk] e-beaming high thermal conductivity non-metals!



Nitin, maybe reactive sputtering of Al with Argon and nitrogen to form ALN
would work. Maybe worth a try. Gary

Gary Hillman
Service Support Specialties, Inc.
PO Box 365
9 Mars Court
Montville, NJ 07045
Telephone 973-263-0640 extension 35
Fax 973-263-8888