Hello,

I have several ceramic wafers to be exposed. While trying to complete
the subsequent photolithography steps, I have encountered the
following problem.
Due to the roughtness of the ceramic surface, it is very difficult to
recognize the alignment marks (or even the structure patterns) in the
microscope... As a consequence, misalignments occure, and that spoils
all the previous work.
Does someone know how to overcome this, or how to enchance the
visibility of the markings?

Thank you!

Regards,


--
Denis Petrov
Ph.D. Student

Institute for Microsensors, -actuators and –systems (IMSAS)

University of Bremen

http://www.imsas.uni-bremen.de