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MEMSnet Home: MEMS-Talk: Another question about silicon dioxide wet etching
Another question about silicon dioxide wet etching
2007-11-17
Xiaoning Wang
SV: [mems-talk] Another question about silicon dioxide wet etching
2007-11-19
eowin rohan
2007-11-19
Gary Hillman
2007-11-19
Kirt Williams
2007-11-22
Qiao Dayong
Another question about silicon dioxide wet etching
Qiao Dayong
2007-11-22
After the NH4F, HF and glycerine being mixed together, stirring is needed and
the
mixture should not be used until the next day to assure that the glycerine has
been completely mixed with the other two. If not, the etching rate of oxide and
aluminium is not the same through the whole ethant, higher or slower than the
average, maybe that is why you got the abnormal results.



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