Hello everyone,

I am looking to make masters for some single-layer microfluidic devices
using SU-8 2050 photoresist on 3" Silicon wafers.  I am trying to see if
I can make do with a UV(Hg) lamp based flood exposure system that
provides a collimated 4" X 4" beam with <5% intensity variation and a
beam divergence angle of 2.6 degrees.  The idea is to perform contact
mode photolithography but without the help of a full-fledged mask
aligner.  The feature sizes that I will be printing are down to 10
microns but typically 50 microns and greater. I will be using
transparency masks that have been printed at greater than 25,400 dpi.  I
want to know if any of you have performed i-line photolithography with
SU-8 using just a UV lamp (not an aligner)?   If so what sort of
resolution have you achieved with the device features?

Thank you!

Best regards,
Dhananjay
[email protected]