Not too many,  why not use CF4 plasma.

Bill Moffat, CEO
Yield Engineering Systems, Inc.
203-A Lawrence Drive, Livermore, CA  94551-5152
(925) 373-8353

[email protected]

www.yieldengineering.com


-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of Sandip Agarwal
Sent: Tuesday, January 08, 2008 7:49 AM
To: [email protected]
Subject: [mems-talk] Etching silicon nitride

I want to pattern silicon nitride by etching with hot phosphoric acid.
What are the photoresists that would withstand these etching conditions?