See:
K. van Schuylenbergh
Xerox Palo Alto Research Center
StressedMetal™ Technology and Its Record Breaking On-Chip Microcoil

Chua, C. L.; Fork, D. K.; Van Schuylenbergh, K.; Lu, J. P. Out-of-plane
high Q inductors on low resistance silicon. Journal of
Microelectromechanical Systems. 2003 December; 12 (6): 989-995.

Chua, C. L.; Fork, D. K.; Van Schuylenbergh, K.; Lu, J. P. High-Q RF
coils on silicon integrated circuits. MEMS Components and Applications
for Industry, Automobiles, Aerospace and Communication II; 2003 January
28-29; San Jose, CA. Bellingham, WA: SPIE; 2003; 4981: 150-155.


2.
ieeexplore.ieee.org/iel5/10171/32491/01516706.pdf

3.
Design of toroidal inductors using stressed metal technology
Jeong-Il Kim Dae-Hee Weon Jong-Hyeok Jeon Mohammadi, S. Katehi, L.P.B.
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA;

This paper appears in: Microwave Symposium Digest, 2005 IEEE MTT-S
International
Publication Date: 12-17 June 2005

----------------------
Refs from:
Bill Flounders
Berkeley Microlab


Nodes Norbert wrote:
> Professor Xinxin Li at Shanghai Institute of Microsystems and Information
Technology (SIMIT) did some work on creating micro inductors by MEMS technology.
Unfortunately, I do not know where it has been published.