A very dilute mixture of fluorine from CF4 or CHF3 and nitrogen or oxygen
should do the trick. Keep the overall ratio of CF4 to less than 5% of the
total gas flow and use a pressure of around 250 mtorr for best results. Bob
Henderson
----- Original Message -----
From: "Chin-Jen Chiang" 
To: 
Sent: Wednesday, January 23, 2008 6:43 PM
Subject: [mems-talk] how to get rid of photoresist residure


> Hi,
>
>   I am trying to use PRS-3000 and NMP at ~80C to get rid of photoresist
residure but either way dose not work. Given the concern of my device
structure, I can not use Pirahna or RIE O2 descuum. Can anyone suggest any
other approach?