Hello, everyone
Recently I found out that conducting photo lithography procedure on
small samples is quite challenging. For example, we have MA/BA 6 Mask
and Bond Aligner in our lab to expose samples with photoresist on
them. However, exposing small samples brings great challenge. I
usually put the small samples on top of a dummy wafer and expose.
Sometimes after finishing exposure the small samples are stuck to the
mask when the wafer holder goes down if the thickness of the samples
is thicker, which also brings damage to the expensive mask. I wonder
if anyone has some good ideas about this tricky problem. I will really
appreciate some good ideas.
Alim Polat, PhD student
Linkoping University
Sweden