Hello,

  My name is Daniel Fine and I am a post doc at the University of Texas at
Austin.  I am trying to ebeam evaporate Pyrex (7740) and am running into a
problem where I am finding it hard to prevent bubbling and thus spitting of the
material when I try to achieve deposition rates of 5 Angstrom per second or
higher.  The films are therefore covered with non-uniform streaks of Pyrex.  I
am using a CHA evaporator.  I have tried a steady beam spot in one place and an
oscillating beam spot as well but get the same problem of large bubble
formation.  I would greatly appreciate any input concerning how I might over
come this problem.

Thanks,
  Daniel Fine