Dear MEMS researchers,

I am currently working on a polysilicon thermocouple(3000A thickness), and would
like to ask some questions regarding the fabrication process.

I would like to know about the input energy of boron and resistivity of
polysilicon when doped with different dosage and temperature conditions.

Also I wonder about the relationship between annealing temperature and time.

If you have any procedures in fabricating thermocouple using polysilicon, I
would be grateful if you can share them with me.

Sincerely yours
BongSeop Kwak
Yonsei University