--IMA.Boundary.898219409
Content-Type: text/plain; charset=US-ASCII
Content-Transfer-Encoding: 7bit
Content-Description: cc:Mail note part
Jason, if you do a search on "SC-1" and "SC-2", you'll probably have
better luck (SC = standard clean).
If organic contamination is your concern, then you may also want to
look at UV-ozone cleaning, which removes organics at least as well as
SC-1 and SC-2, and it is a dry cleaning method. Both methods are
described in "Handbook of Semiconductor Wafer Cleaning Technology -
Science, Technology and Applications," edited by Werner Kern, Noyes
Publications, 1993.
In simplest terms, in the UV-ozone method, short wavelength UV
generates atomic oxygen and excites or dissociates the organic
molecules which react with the atomic oxygen. The results are CO2,
water, and other light molecules that desorb.
..............John.
>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>
O John R. Vig, Ph.D.
O U. S. Army Communications-Electronics Command
O Attn: AMSEL-RD-C2-TP
O Ft. Monmouth, NJ 07703-5602, U.S.A.
O Telephone: 732-427-4275, FAX: 732-427-4805
O E-mail: [email protected]
> >>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>
______________________________ Reply Separator _________________________________
Subject: RCA Etch??
Author: Jason Tauscher at Internet_Gateway
Date: 8/24/98 9:33 AM
Someone mentioned a solution used to clean off Organic contaminants
called RCA Etch or something similar. It was developed in the 70's or
earlier, but I can't find any literature on it. I believe that it
contains H2O2 and H2SO4 but I don't know in what proportions. If anyone
can help me out, I'd appreciate it.
We're having some problems with "sticking" of our capacitive
accelerometers and want to eliminate the possibility of organic
contaminants. Any suggestions would be appreciated.
Thanks.
Jason Tauscher
[email protected]
--IMA.Boundary.898219409
Content-Type: text/plain; charset=US-ASCII; name="RFC822 message headers"
Content-Transfer-Encoding: 7bit
Content-Description: cc:Mail note part
Content-Disposition: inline; filename="RFC822 message headers"
Received: from cecom10.monmouth.army.mil (134.80.0.10) by
doim6.monmouth.army.mil with SMTP
(IMA Internet Exchange 2.1 (Gold Candidate) Enterprise) id 000B721D; Fri, 4
Sep 98 01:53:32 -0400
Received: from ruebert.ieee.org (ruebert.ieee.org [199.172.136.3])
by cecom10.monmouth.army.mil (8.8.6/8.8.6) with ESMTP id BAA07965
for ; Fri, 4 Sep 1998 01:53:31 -0400 (EDT)
Received: from darkstar.isi.edu by ruebert.ieee.org (8.8.8/8.8.8) with ESMTP
id BAA05434; Fri, 4 Sep 1998 01:53:23 -0400 (EDT)
Received: (from daemon@localhost)
by darkstar.isi.edu (8.8.7/8.8.6) id WAA09339
for mems-out-list; Thu, 3 Sep 1998 22:30:27 -0700 (PDT)
Received: (from mems@localhost)
by darkstar.isi.edu (8.8.7/8.8.6) id WAA09331;
Thu, 3 Sep 1998 22:30:26 -0700 (PDT)
Message-Id: <[email protected]>
From: Jason Tauscher
Subject: RCA Etch??
Date: Mon, 24 Aug 98 09:33:00 PDT
To: [email protected]
X-URL: http://mems.isi.edu/mems.html
Reply-To: Jason Tauscher , [email protected]
--IMA.Boundary.898219409--