Dear Friends,

We intend to do anodization of aluminum foil in sulphiric acid, oxalic acid and
phosphoric acid. Anodization voltage will be 25 V to 100 V and concentrations of
acids will be about 4 percent by weight.

We need to put a photoresist on Al surface and then open 2 micron diameter
circles in photoresist by photolithography.

Please suggest some resist for our purpose. Make sure the resist can withstand
the acids, and have adequate breakdown voltage and offers resolution of about
0.5 to 1 micron..

Thanks to all.

with love and best wishes,
Pradeep Sharma,

Laboratory NB 02,
IAMS, Academia Sinica,
P.O. Box: 23-166,
Taipei-106, Taiwan, R.O.C.

Phone Number: 00886-2-2362-4901 (Laboratory)
              00886-910984500 (Mobile)