Thanks Sarosh for the information I haven't been aware of.
Could you provide more details about how HF etches Si?
Repetition of oxidation of Si by DI and etching of SiO2 by HF?

----- Original Message -----
From: "Sarosh Khwaja" 
To: "General MEMS discussion" 
Sent: Tuesday, June 24, 2008 6:29 AM
Subject: Re: [mems-talk] Glass to Kovar anodic bonding


Funny, I came across this in Madou today. If I remember correctly, it was
around 0.3Å/min in pure HF solution. Principles of Microfabrication by
Madou, in the wet-etching chapter, look it up.