A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Polymer residual about RIE etching of SiO2 by CHF3
Polymer residual about RIE etching of SiO2 by CHF3
2008-06-19
liuxf
2008-06-20
Kvel Bergtatt
2008-06-21
Andrew Sarangan
2008-06-23
Kvel Bergtatt
2008-06-25
liuxf
Polymer residual about RIE etching of SiO2 by CHF3
liuxf
2008-06-25
Thanks a lot, sir
well, do you have experience that whether the SPM wet clean process will etch Cr
layer?
thanks
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Process Variations in Microsystems Manufacturing
The Branford Group
Mentor Graphics Corporation
Tanner EDA by Mentor Graphics