Hi
I´m using black wax as wet etching protector. In bibliografy it is
dissolved in toluene and cured at 100 ºC in oven for 1 hs, then after
being deposited on the wafer. The problem is that this protective film
only takes about an hours in KOH 40% at 60ºC.
Someone has experience what are the optimal conditions for working with
this material?
Thanks
Anahí

--

Lic. Anahi F. Weinstock

INSTITUTO NACIONAL DE TECNOLOGÍA INDUSTRIAL
CENTRO DE INVESTIGACIÓN Y DESARROLLO EN
TELECOMUNICACIONES, ELECTRÓNICA E INFORMÁTICA

Teléfono (54 11) 4724 6200/6300/6400
Interno 6377
Fax (54 11 ) 4754 5194
[email protected]
0800 444 4004 | www.inti.gov.ar