Try a oxide etching as a pre-step; native oxide and organic junk inhibits Si
etching; also make sure to use a dilute TMAH solution, hight temperature and
sonication if possible.

On Fri, Jul 25, 2008 at 10:18 PM, Muk Mei Yu  wrote:

> Hi,
>
> Did anyone encounter 'etch initiation' failure for Si etch in TMAH solution
> before? Some refer etch initiation failure as passivation of Si during
> etching which prohibits etching of Si. Si presents un-etched after the whole
> process. What are the casues of this phenomenon? Any measures to help
> mitigate this defect?
>
> Thanks,
> Muk

--
_fm