Dear all,

I was trying to obtain >100um thick of patterned SU8 2075. The used receipe is
as follows:

spin: 500rpm/10s+1700rpm/30sec
soft bake: 65 C/5 mins +95 C/20min
UV expose: 28 sec.
PEB: 65 C/5 mins +95 C/10 min
develop: 10 mins.

all designed patterns are large ( all around 50-200um). However, using profiler,
the  step of the developed patterns is only about 66 um thick.

Could anyone kindly suggest the possible reasons for such thin resist?

Many thanks.
Jiang