You're trying to etch silicon, right? Try the HF:HNO3:CH3COOH system. In
this, HNO3 oxidizes Si, which is then etched by HF. There are lots of papers
on it but start with Madou.

On Fri, Aug 22, 2008 at 9:11 AM, Moshe  wrote:

> > Hello
> > When I operate wet etch to thin silicon wafer I get like
> > scratches on the surface.
> > I am locking for technique to get smooth surface on the silicon
> > wafer when I operate thinning by wet etch .
> > The wafer is without any mask.
> > Thank You