I did some research on positive resist development but could not find
any literature that shows what the development mechanism is of the
indene-carboxylic acid photoproduct.  Am I to assume that it's a straight
redox reaction (we use NaOH for our developer) producing a soluble salt
by-product and water?

      On a related note, I am trying to develop a flood expose and develop
strip system to remove photoresist (using a mercury arc lamp as an exposure
source and our current developer to strip).  It worked well in the initial
stages, but now we are getting some residue which seems to be a result of
the photoresist being affected by other wet processes involving
permanganate and/or iodine.  Would increasing NaOH concenration help
dissolve the resist?  Your thoughts are appreciated.