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MEMSnet Home: MEMS-Talk: Positive Resist Development Mechanism
Positive Resist Development Mechanism
2008-09-02
[email protected]
2008-09-03
Brad Cantos
2008-09-04
Richard B. Keithley
2008-09-04
[email protected]
2008-09-03
Shay Kaplan
2008-09-03
[email protected]
2008-09-03
Bill Moffat
2008-09-04
[email protected]
2008-09-04
Brad Cantos
Positive Resist Development Mechanism
[email protected]
2008-09-04
Or does plasma cleaning help because it removed a top layer of crosslinked
resist so that the developer can attack the "virgin" layer?  Is that the
premise?


[email protected] writes:

Hi Brad/Bill,

      I am totally intrigued by your suggestions.  How does plasma cleaning
help development?  Does it reverse the cross-linking that occurs?  Again,
our aim was to re-expose used resist and strip it off by development.  The
issue is that a top layer of that resist has been cross-linked (based on
development behavior) and in some instances, leave residue on the wafer.
Your thoughts are appreciated.
reply
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