Dear Jason,

typical chemicals for wet cleaning of silicon wafers (RCA Standard Clean,
RCA Review, p. 187, June 1970):

organics:     SPM - sulfuric acid/hydrogen peroxide mixture (I use
H2SO4/H2O2 - 4:1)
                    APM - ammonium hydroxide/hydrogen peroxide/DI water
mixture (NH4/H2O2/DIW - 1:1:8)


Ladislav


Jason Tauscher wrote:

> Someone mentioned a solution used to clean off Organic contaminants
> called RCA Etch or something similar.  It was developed in the 70's or
> earlier, but I can't find any literature on it.  I believe that it
> contains H2O2 and H2SO4 but I don't know in what proportions.  If anyone
> can help  me out, I'd appreciate it.
>  We're having some problems with "sticking" of our capacitive
> accelerometers and want to eliminate the possibility of organic
> contaminants.  Any suggestions would be appreciated.
>
> Thanks.
>
> Jason Tauscher
>
>
> [email protected]



--
LADISLAV MATAY
Institute of Computer Systems
Slovak Academy of Sciences
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