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MEMSnet Home: MEMS-Talk: Re: RCA Etch??
Re: RCA Etch??
1998-09-04
John Vig
1998-09-04
Ladislav Matay
1998-09-04
Richard Gates
1998-09-04
MARK HAMMOND
1998-09-07
Armin Kuebelbeck
Re: RCA Etch??
Armin Kuebelbeck
1998-09-07
Dear Jason,

No H2O2 + H2SO4 is called Piranha - guess why - and used to remove
organics.
There are 2 RCA cleans existing:
SC1 (special clean 1)
A mixture of 5 parts water + 1 part H2O2  (30%) + 1 part Ammonia
solution (28%) used at about 65 °C. Mixture is stable for about 8 hours.
The mixture is removing light organic contaminations, but is mainly
dedicated to remove particles.

SC2
A mixture of 6 parts water + 1 part H2O2 (30%) + 1 part HCl (32%). Is
used after SC1 and intensive rinsing, to remove metallic contaminations
and to grow up a chemical oxide.

All parts are by volume!

Best regards

Armin


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