A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: light type and intensity for a clean room lithography area
light type and intensity for a clean room lithography area
2008-10-15
Laura Oropeza Ramos
2008-10-15
SEBESTA Edward
2008-10-15
Bill Moffat
2008-10-16
eowin rohan
light type and intensity for a clean room lithography area
2008-10-16
Shay Kaplan
light type and intensity for a clean room lithography area
Laura Oropeza Ramos
2008-10-15
Hello all,

We are planning the construction of a clean room for MEMS polymer
fabrication in Mexico City. I can not find information about if there is a
standard way to determine the yellow light intensity in the lithography
clean room areas. If somebody could give me an advice on this, it would be
highly appreciated.

Thanks so much

Laura A. Oropeza Ramos, Ph.D.
Posdoctoral Researcher
IIMAS-Institute of Applied Mathematics and Systems
UNAM
Apartado Postal 20-726, Administración No. 20
Delegación Alvaro Obregón, México 01000, D.F.
México
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
The Branford Group
Process Variations in Microsystems Manufacturing
Nano-Master, Inc.
Harrick Plasma, Inc.