A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: light type and intensity for a clean room lithography area
light type and intensity for a clean room lithography area
2008-10-15
Laura Oropeza Ramos
2008-10-15
SEBESTA Edward
2008-10-15
Bill Moffat
2008-10-16
eowin rohan
light type and intensity for a clean room lithography area
2008-10-16
Shay Kaplan
light type and intensity for a clean room lithography area
Bill Moffat
2008-10-15
I do not think there is a standard.  We used to fit the yellow room with
standard fluorescent lights then put a yellow sleeve over the light tube.  The
yellow filter removes the U.V. portion of the light so the photo resist is not
exposed at the wrong times.

 Bill Moffat

-----Original Message-----
From: [email protected] [mailto:[email protected]] On
Behalf Of Laura Oropeza Ramos
Sent: Wednesday, October 15, 2008 9:29 AM
To: [email protected]
Subject: [mems-talk] light type and intensity for a clean room lithographyarea

Hello all,

We are planning the construction of a clean room for MEMS polymer fabrication in
Mexico City. I can not find information about if there is a standard way to
determine the yellow light intensity in the lithography clean room areas. If
somebody could give me an advice on this, it would be highly appreciated.

Thanks so much

Laura A. Oropeza Ramos, Ph.D.
reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Process Variations in Microsystems Manufacturing
University Wafer
Addison Engineering
MEMStaff Inc.