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MEMSnet Home: MEMS-Talk: light type and intensity for a clean room lithography area
light type and intensity for a clean room lithography area
2008-10-15
Laura Oropeza Ramos
2008-10-15
SEBESTA Edward
2008-10-15
Bill Moffat
2008-10-16
eowin rohan
light type and intensity for a clean room lithography area
2008-10-16
Shay Kaplan
light type and intensity for a clean room lithography area
Shay Kaplan
2008-10-16
The standard for working environment calls for 600-1000 LUX. It is hard to
get with yellow lights so unless you plan to do fine work in the room, 600
LUX is a good number.
You can use either yellow lamps (expensive), yellow sleeves or yellow
transparent tape on the lamp glass cover. Make sure most light below 470 nm
is blocked.
Shay Kaplan

--- Den ons 2008-10-15 skrev Laura Oropeza Ramos :
Fr?n: Laura Oropeza Ramos 
?mne: [mems-talk] light type and intensity for a clean room lithography area
Till: [email protected]
Datum: onsdag 15 oktober 2008 18.29

Hello all,

We are planning the construction of a clean room for MEMS polymer
fabrication in Mexico City. I can not find information about if there is a
standard way to determine the yellow light intensity in the lithography
clean room areas. If somebody could give me an advice on this, it would be
highly appreciated.

Thanks so much

Laura A. Oropeza Ramos, Ph.D.
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