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MEMSnet Home: MEMS-Talk: SU-8 layer stick to mask after exposure
SU-8 layer stick to mask after exposure
2008-10-21
郑瑞麟(Ruilin Zheng)
2008-10-21
Bill Moffat
2008-10-21
GARCIA BLANCO Sonia
2008-10-22
郑瑞麟(Ruilin Zheng)
2008-10-22
Gareth Jenkins
2008-10-23
Javier Crespo
2008-10-23
Bill Moffat
2008-10-21
Michael Larsson
2008-10-22
Michael Larsson
2008-10-23
Suzanne Scullen Ericson
2008-10-24
郑瑞麟(Ruilin Zheng)
2008-10-24
Gareth Jenkins
2008-11-07
郑瑞麟(Ruilin Zheng)
SU-8 layer stick to mask after exposure
GARCIA BLANCO Sonia
2008-10-21
Hi Ruilin,

I had that porblem once and it was due to insufficient soft-bake temperature.
Check if you have maybe some problem with your hotplate? If that is correct,
maybe you are under-exposing.

Good luck!

Sonia Garcia Blanco, PhD
Researcher MOMS
INO
2740 rue Einstein
Quebec, G1P4S4, CANADA


-----Message d'origine-----
De : 郑瑞麟(Ruilin Zheng) [mailto:[email protected]]
Envoyé : Tuesday, October 21, 2008 7:23 AM
À : [email protected]
Objet : [mems-talk] SU-8 layer stick to mask after exposure

Hello, everyone,

I met a problem in SU-8 process recently, the SU-8 layer stick to the mask after
exposure.
I rarely have this problem before. Two weeks ago, I applied an Omega UV filter
for the exposure step to filter out short wavelength UV light.
And this problem appear every time during exposure.
At first I think it may be caused by insufficient soft-bake dose, but after I
tried to prolong the baking time and use higher temperature, SU-8 layer still
sticked to the mask.
Does anyone have some ideas about this problem? Please help me out.

By the way, the photoresist is SU-8 2150 by microchem, will be expired at
Dec,2008.
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