Jarod,

Many years ago, there was a program called "PROLITH" that modeled exposure
and development simulations for positive novalac photoresists.  Below is a
reference to a paper that introduced it.  A few years after it was
introduced they tried to market it commercially, and I don't know the
current status.  You may be able to trace down the author, Chris Mack.

Mack C. A. : ³PROLITH : a comprehensive optical lithography model² ,
SPIE, 538, pp. 207-219 (1985).

Brad Cantos


On 10/22/08 12:22 PM, "jarod vincent"  wrote:

> Dear all,
>
> Is there any software for etching/development simulation? I found there is
> no such package in Ansys. Is there any commercial software?
> Thank you for suggestion.
>
> Best Regards
> Jarod Vincent