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MEMSnet Home: MEMS-Talk: SU-8 layer stick to mask after exposure
SU-8 layer stick to mask after exposure
2008-10-21
郑瑞麟(Ruilin Zheng)
2008-10-21
Bill Moffat
2008-10-21
GARCIA BLANCO Sonia
2008-10-22
郑瑞麟(Ruilin Zheng)
2008-10-22
Gareth Jenkins
2008-10-23
Javier Crespo
2008-10-23
Bill Moffat
2008-10-21
Michael Larsson
2008-10-22
Michael Larsson
2008-10-23
Suzanne Scullen Ericson
2008-10-24
郑瑞麟(Ruilin Zheng)
2008-10-24
Gareth Jenkins
2008-11-07
郑瑞麟(Ruilin Zheng)
SU-8 layer stick to mask after exposure
Gareth Jenkins
2008-10-24
You can reduce it by leaving your wafer to relax for about 1 hour
before starting the softbake.

I have also experimented in the past with a low spin speed and
cleanroom wipe well soaked in acetone but this often went wrong and
made matters worse!


2008/10/24 郑瑞麟(Ruilin Zheng) :
> Hello,
>
> Thanks again!
>
> The edge bead exist on the SU-8 layer, and I checked samples to find out the
> stiction happens at or around the edge bead.
>
> And the humidity is not very different from before when stiction rarely
> happen, it is about 65-74%.
>
> By the way, there is  no edge bead remove facility in my spin-coater. Could
> anybody show me a simple measure to remove edge bead?
reply
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